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Data relating to "Combinatorial Sputtering of Photoluminescent Europium Titanium Oxide Thin Films"
Date published
2024-11-08
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Cranfield University
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Photoluminescent thin films were fabricated using a combinatorial physical vapour deposition (PVD) sputtering process, enabling rapid variation of europium oxide (Eu2O3) in titanium dioxide (TiO2) with concentrations varying from x = 0 to 1 in x = Eu/(Eu+Ti).
Figure 1: The relationship of the composition x as a function of L in Eu/(Eu+Ti).
Figure 2: The emission spectra of samples with different components.
Figure 3: Powder XRD patterns data of samples with different components.
Figure SI 9&10&11: Powder XRD pattern data of quartz substrate, and Thin film XRD patterns data of samples with different components.
Figure SI 12&13: Raman spectra data of samples with different components.
Figure SI 14&15: Excitation and emission spectra of samples with x = 6 at% and 8 at% as-deposition, after annealing at 450˚C and annealing at 600˚C.
Figure SI 16: Excitation of 5 at%, 6 at%, 8 at%, 18 at%, 26 at%, 77 at% and 98 at% Eu/(Eu+Ti) samples after annealing at 600˚C.
Figure SI 17&18: Transmittance and Bandgap of x = 0 at%, 6 at%, 26 at%, 77 at%, 98 at% and 100 at% thin films.
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Keywords
Europium Titanium Oxide, Physical Vapour Deposition, Combinatorial Sputtering, Photoluminescence
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Attribution-NoDerivatives 4.0 International