Atomic layer deposited oxide films as protective interface layers for integrated graphene transfer

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dc.contributor.authorCabrero-Vilatela, Andrea
dc.contributor.authorAlexander-Webber, Jack
dc.contributor.authorSagade, Abhay
dc.contributor.authorAria, Adrianus Indrat
dc.contributor.authorBraeuninger-Weimer, Philipp
dc.contributor.authorMartin, Marie-Blandine
dc.contributor.authorWeatherup, Robert
dc.contributor.authorHofmann, Stephan
dc.date.accessioned2017-11-02T16:04:03Z
dc.date.available2017-11-02T16:04:03Z
dc.date.issued2017-10-17
dc.description.abstractThe transfer of chemical vapour deposited (CVD) graphene from its parent growth catalyst has become a bottleneck for many of its emerging applications. The sacrificial polymer layers that are typically deposited onto graphene for mechanical support during transfer are challenging to fully remove and hence leave graphene and subsequent device interfaces contaminated. Here, we report on the use of atomic layer deposited (ALD) oxide films as protective interface and support layers during graphene transfer. The method avoids any direct contact of the graphene with polymers and through the use of thicker ALD layers (≥100nm), polymers can be eliminated from the transfer-process altogether. The ALD film can be kept as a functional device layer, facilitating integrated device manufacturing. We demonstrate back-gated field effect devices based on single-layer graphene transferred with a protective Al2O3 film onto SiO2 that show significantly reduced charge trap and residual carrier densities. We critically discuss the advantages and challenges of processing graphene/ALD bilayer structures.en_UK
dc.identifier.citationCabrero-Vilatela A, Alexander-Webber JA, Sagade A, et al., (2017) Atomic layer deposited oxide films as protective interface layers for integrated graphene transfer. Nanotechnology, Volume 28, Issue 48, December 2017, Article number 485201en_UK
dc.identifier.cris18798454
dc.identifier.issn0957-4484
dc.identifier.urihttp://dx.doi.org/10.1088/1361-6528/aa940c
dc.identifier.urihttps://dspace.lib.cranfield.ac.uk/handle/1826/12698
dc.language.isoenen_UK
dc.publisherIOP Publishing: Hybrid Open Accessen_UK
dc.rightsAttribution 3.0 International
dc.rights.urihttp://creativecommons.org/licenses/by/3.0/
dc.titleAtomic layer deposited oxide films as protective interface layers for integrated graphene transferen_UK
dc.typeArticleen_UK

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