Design of experiment for the optimisation of deep reactive ion etching of silicon inserts for micro-fabrication

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dc.contributor.authorWallis, K.
dc.contributor.authorShaw, Christopher P.
dc.contributor.authorAlcock, Jeffrey R.
dc.date.accessioned2016-10-28T12:36:08Z
dc.date.available2016-10-28T12:36:08Z
dc.date.issued2012-12-31
dc.description.abstractThe following paper describes a design of experiments investigation of the deep reactive of pillar structures on a silicon wafer. The etched wafers would subsequently be used as masters for the fabrication of nickel mould inserts for microinjection moulding. Undercuts occur when the pillar base has a smaller cross-section than the apex of the pillar. They therefore affect tolerances of the subsequent nickel mould, its strength and its de-mouldability from the silicon form. The response measured in these experiments was the degree of undercut of micro-scale (10 μm x 10 μm x 40 μm, 5 μm x 5 μm x 40 μm and 2 μm x 2 μm x 40 μm) The literature suggests that gas pressure, platen power, gas flow rate, phase switching times and mask size can all affect the degree of undercut. After examination of this literature, and of manufacturers guidelines, three parameters were selected for experimental testing: platen power, C 4F 8 gas flow rate during the passivation phase and switching times. Switching times was found to be the only statistically significant parameter for both 10x10 μm and 5x5 μm pillars. The 2x2 μm pillars were not successfully replicated and could therefore not undergo statistical evaluation.en_UK
dc.identifier.citationWallis, K., Shaw, C. P., Alcock, J. R. (2012) Design of experiment for the optimisation of deep reactive ion etching of silicon inserts for micro-fabrication, Micromachining and Microfabrication Process Technology XVII, San Francisco, California, USA, 24-26 January 2012en_UK
dc.identifier.issn0277-786X
dc.identifier.urihttp://dx.doi.org/10.1117/12.906772
dc.identifier.urihttps://dspace.lib.cranfield.ac.uk/handle/1826/10904
dc.language.isoenen_UK
dc.publisherSPIEen_UK
dc.rightsPublished by SPIE. This is the Author Accepted Manuscript. This article may be used for personal use only. The final published version (version of record) is available online at http://dx.doi.org/10.1117/12.906772 . Please refer to any applicable publisher terms of use.en_UK
dc.titleDesign of experiment for the optimisation of deep reactive ion etching of silicon inserts for micro-fabricationen_UK
dc.typeArticleen_UK

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