Nanosecond-range imprint and retention characterized from polarization-voltage hysteresis loops in insulating or leaky ferroelectric thin films

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dc.contributor.author Jiang, A. Q. -
dc.contributor.author Liu, X. B. -
dc.contributor.author Zhang, Qi -
dc.date.accessioned 2011-10-24T23:03:13Z
dc.date.available 2011-10-24T23:03:13Z
dc.date.issued 2011-10-03T00:00:00Z -
dc.identifier.citation A. Q. Jiang, X. B. Liu, and Q. Zhang, Nanosecond-range imprint and retention characterized from polarization-voltage hysteresis loops in insulating or leaky ferroelectric thin films, Applied Physics Letters, Volume 99, Issue 14, 2011, Paper Number 142905.
dc.identifier.issn 0003-6951 -
dc.identifier.uri http://dx.doi.org/10.1063/1.3647577 -
dc.identifier.uri http://dspace.lib.cranfield.ac.uk/handle/1826/6521
dc.description.abstract We transferred ferroelectric domain switching currents under pulses into polarization-voltage (P-V) hysteresis loops. With this transformation, it is possible to derive the remanent polarization and coercive voltage from domain switching currents after the shortest imprint and retention time of 35 ns. After the separation of film leakage current from domain switching current, we measured the P-V hysteresis loop in a semiconducting BiFeO3 leaky thin film, where the apparent coercive field highly reaches 320 kV/cm2, suggestive of a different domain switching mechanism from other insulators. This technique facilitates nanosecond-range measurements of both ferroelectric capacitive and resistive memories. en_UK
dc.language.iso en_UK -
dc.publisher American Institute of Physics en_UK
dc.title Nanosecond-range imprint and retention characterized from polarization-voltage hysteresis loops in insulating or leaky ferroelectric thin films en_UK
dc.type Article -


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