The synthesis of CuxS from Cu layers by low pressure plasma processing

Show simple item record

dc.contributor.author Ball, J.
dc.contributor.author Lane, David W.
dc.contributor.author Reehal, H. S.
dc.date.accessioned 2017-05-25T10:22:54Z
dc.date.available 2017-05-25T10:22:54Z
dc.date.issued 2017-03-04
dc.identifier.citation Ball J, Lane DW, Reehal HS. (2017) The synthesis of CuxS from Cu layers by low pressure plasma processing, Journal of Alloys and Compounds, Volume 708, June 2017, pp. 1124-1130 en_UK
dc.identifier.issn 0925-8388
dc.identifier.uri http://dx.doi.org/10.1016/j.jallcom.2017.03.011
dc.identifier.uri http://dspace.lib.cranfield.ac.uk/handle/1826/11929
dc.description.abstract A new method of converting Cu layers to CuxS on glass at low pressure using an electron cyclotron resonance plasma and SF6 gas is presented. The process operates at low temperatures and short time scales. Trends in film crystallinity and morphology are identified in relation to process time and temperature. These show that sulphurisation is most likely complete within 10 min and that the sulphur content of the films reduces as the conversion temperature is increased from 473 to 623 K. Optical measurements show that the films have a direct bandgap of ∼2.5 eV which is consistent with published values for CuxS films grown by other techniques. Analysis by SEM has revealed that the films possess a complicated structure of platelets covering a denser underlying film. This may account for the differences in observations made by XRF and Raman spectroscopy, which both indicated a mixture of CuS and Cu2S, and X-ray diffraction which predominantly showed CuS. en_UK
dc.language.iso en en_UK
dc.publisher Elsevier en_UK
dc.rights Attribution-NonCommercial-NoDerivatives 4.0 International
dc.rights.uri http://creativecommons.org/licenses/by-nc-nd/4.0/
dc.subject Semiconductors en_UK
dc.subject Thin films en_UK
dc.subject Vapour deposition en_UK
dc.subject SEM en_UK
dc.subject X-ray diffraction en_UK
dc.title The synthesis of CuxS from Cu layers by low pressure plasma processing en_UK
dc.type Article en_UK
dc.identifier.cris 16982833


Files in this item

This item appears in the following Collection(s)

Show simple item record

Attribution-NonCommercial-NoDerivatives 4.0 International Except where otherwise noted, this item's license is described as Attribution-NonCommercial-NoDerivatives 4.0 International

Search CERES


Browse

My Account

Statistics