Fanara, C.; Shore, Paul; Nicholls, John R.; Lyford, N.; Kelley, J.; Carr, J.; Sommer, P.
(John Wiley & Sons, Ltd, 2006-01-01)
Results on reactive atom plasma etching performed on ULE® (Corning Ultra Low
Expansion) glass samples at atmospheric pressure are presented for the first
time. A reactive atomic plasma technology (RAPT®), has been developed ...