Brzezinka, Tomasz L.; Rao, Jeff; Chowdhury, Mohamad; Kohlscheen, Joern; Fox-Rabinovich, German S.; Veldhuis, Stephen C.; Endrino, José L.
(MDPI, 2017-09-16)
Combinatorial deposition, comprising filtered cathodic vacuum arc (FCVA) and physical vapor deposition (PVD) magnetron sputtering is employed to deposit molybdenum disulphide (MoS2) and titanium (Ti) thin films onto ...