Aria, Adrianus Indrat; Nakanishi, Kenichi; Xiao, Long; Braeuninger-Weimer, Philipp; Sagade, Abhay A.; Alexander-Webber, Jack; Hofmann, Stephan
(ACS Applied Materials and Interfaces, 2016-10-10)
Atomic layer deposition (ALD) of ultrathin aluminum oxide (AlOx) films was systematically studied on supported chemical vapor deposition (CVD) graphene. We show that by extending the precursor residence time, using either ...